Analytical Sciences

Abstract − Analytical Sciences, 26(2), 227 (2010).

Development of the Hard-X-ray Angle Resolved X-ray Photoemission Spectrometer for Laboratory Use
Masaaki KOBATA,*1 Igor PÍŠ,*1,*2 Hideo IWAI,*3 Hiromichi YAMAZUI,*4 Hiroaki TAKAHASHI,*4 Mineharu SUZUKI,*4 Hiroyuki MATSUDA,*5 Hiroshi DAIMON,*5 and Keisuke KOBAYASHI*1
*1 National Institute for Materials Science (NIMS), SPring-8 BL15XU, 1-1-1 Koto, Sayo-cho, Sayo, Hyogo 679-5148, Japan
*2 Department of Surface and Plasma Science, Faculty of Mathematics and Physics, Charles University in Prague, 18000 Prague 8, Czech Republic
*3 National Institute for Materials Science (NIMS), 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
*4 ULVAC-PHI, Inc., 370 Enzo, Chigasaki, Kanagawa 253-8522, Japan
*5 Graduate School of Materials Science, Nara Institute of Science and Technology (NAIST), 8916-5 Takayama, Ikoma, Nara 630-0192, Japan
This article reports development of a practical laboratory hard X-ray photoelectron spectroscopy (HXPS) system by combining a focused monochromatic Cr Kα X-ray source, a wide angle acceptance objective lens and a high kinetic energy electron analyzer. The Cr Kα source consists of a Cr target, a 15 kV focused electron gun, and a compact bent crystal monochromator. The X-ray spot size is variable from 10 μm (1.25 W) to 200 μm (50 W). A wide acceptance angle objective lens is installed in front of a hemispherical analyzer. The total resolution of 0.53 eV was obtained by Au Fermi-edge measurements. Angle acceptance of ±35° with angle resolution of 0.5° was achieved by measuring Au 3d5/2 peak through a hemicylinder multi-slit on an Au thin strip, in angle resolution mode. As the examples, silicon based multilayer thin films were used for showing the possibilities of deeper (larger) detection depth with the designed system.