Abstract − Analytical Sciences, 16(6), 653 (2000).
Correlation between the Relative Sensitivity Factors and the Sputtering Yields in Glow-Discharge Mass Spectrometry
Takashi SAKA* and Mika INOUE**
*Department of Applied Electronics, Daido Institute of Technology, 2-21 Daido-cho, Minami, Nagoya457-8531, Japan
**Research and Development Lab., Daido Steel Co. Ltd., 2-30 Daido-cho, Minami, Nagoya 457-8545, Japan
**Research and Development Lab., Daido Steel Co. Ltd., 2-30 Daido-cho, Minami, Nagoya 457-8545, Japan
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